2016年1月13日星期三

Hafnium (Hf) Sputtering Targets Shenzhen Sunrise Metal Industry Co.,Ltd

Hafnium (Hf) Sputtering Targets 

Shenzhen Sunrise Metal Industry Co.,Ltd

TEL:0086-0755-27185042 
Website:http://www.sunriseta.com

E-Mail:sales@sunriseta.com

Specifications
(2N) 99% Hafnium Sputtering Target Request
         (2N5) 99.5% Hafnium Sputtering Target Request
         (3N) 99.9% Hafnium Sputtering Target Request
         (3N5) 99.95% Hafnium Sputtering Target Request
         (4N) 99.99% Hafnium Sputtering Target Request
         (5N) 99.999% Hafnium Sputtering Target          

Properties

Molecular Weight 178.49
Appearance Silver
Melting Point 2227°C
Boiling Point 4602°C
Density 13.31 g/cm3
Thermal Expansion (25 °C) 5.9 µm·m-1·K-1
Poisson Ratio 0.37
Vickers Hardness 1760 MPa
Young's Modulus 78 GPa
Tensile Strength N/A
Thermal Conductivity 0.230 W/cm/K @ 298.2 K
Electronegativity 1.3 Paulings
Specific Heat 0.035 Cal/g/K @ 25 °C
Heat of Vaporization 155 K-Cal/gm atom at 4602°C

Material TypeHafnium
SymbolHf
Atomic Weight178.49
Atomic Number72
Color/AppearanceGray Steel, Metallic
Thermal Conductivity23 W/m.K
Melting Point (°C)2,227
Coefficient of Thermal Expansion5.9 x 10-6/K
Theoretical Density (g/cc)13.09
Z Ratio0.36
SputterDC
Max Power Density
(Watts/Square Inch)
50
Type of BondIndium
Export Control (ECCN) 1C231

Z-Factors

Empirical Determination of Z-Factor
Unfortunately, Z Factor and Shear Modulus are not readily available for many materials. In this case, the Z-Factor can also be determined empirically using the following method:
  • Deposit material until Crystal Life is near 50%, or near the end of life, whichever is sooner.
  • Place a new substrate adjacent to the used quartz sensor.
  • Set QCM Density to the calibrated value; Tooling to 100%
  • Zero thickness
  • Deposit approximately 1000 to 5000 A of material on the substrate.
  • Use a profilometer or interferometer to measure the actual substrate film thickness.
  • Adjust the Z Factor of the instrument until the correct thickness reading is shown.
Another alternative is to change crystals frequently and ignore the error. The graph below shows the % Error in Rate/Thickness from using the wrong Z Factor. For a crystal with 90% life, the error is negligible for even large errors in the programmed versus actual Z Factor.


NOTE: This is an Export Controlled Material. Restrictions may apply.

















铌钨铪合金 Shenzhen Sunrise Metal Industry Co.,Ltd

铌钨铪合金
Shenzhen Sunrise Metal Industry Co.,Ltd
TEL0086-0755-27185042
Website
http://www.sunriseta.com
E-Mail
mary@sunriseta.com
 
    
铌钨铪合金(niobium tungsten hafnium alloy)
以铌为基加入一定量的钨和铪而形成的铌合金。它是在铌钨合金的基础上发展起来的。铌钨合金随钨含量的增加强度增大,塑性一脆性转变温度升高,焊接性和涂层性能变坏。在铌钨合金中加入一定量的铪和钇等元素,可改善合金的涂层性能和焊接性能,降低塑性一脆性转变温度,提高蠕变强度。1962年,美国研制成功Nb-10W-10Hf合金,以后又发展成Nb-10W-10Hf-0.1Y合金。铌钨铪合金按强化方式可分成固溶强化合金和弥散强化合金。
性能 中国铌钨铪合金的力学性能列于表中。
铌钨铪合金的力学性能
合  金相当国外牌号试验温度/℃抗拉强度/MPa屈服强度/MPa  伸长率/%
      Nb-10W-10Hf        Cb-132      室温    1093     1371    1645    607.1    332     179    73.4    49l_5    223.8     158.5    72.7    26    27     >67    62
      Nb-10W-10Hf -0.1Y        Cb-129Y      室温    1093     1371    1645    583    274.4     150.9    76.4    466.5    205.8     150.9    72.0    25    45     75    78

制备方法 铌钨铪合金常采用电子束熔炼和真空自耗电弧熔炼法制备锭坯。然后在1200℃以上温度进行挤压和锻造开坯,500℃以下温度进行轧制和拉拔,可制备棒材、板材、线材和管材等产品。切削、焊接、涂层、热处理等与铌合金相似。
用途 铌钨铪合金可用于制造长期工作在1645℃以下的航天飞机、导弹、空间发电系统的零件和导管等。